Etidronic Acid HEDP CAS 2809-21-4

CAS:2809-21-4

Cov mis molecular:C2H8O7P2

Qhov Hnyav Molecular:206.03

Lub Sijhawm Khaws Cia:1 xyoo

Cov lus txhais:ETHANE-1-HYDROXY-1,1-DIPHOSPHONICACID,95+%; (1-Hydroxyethylidene)biphosphonicacid; HydroxyethylideneDiphosphonicacid (HEDP); 1-Hydroxyethylidene-1,1-diphosphonicacid,min.95% HEDP; 1-Hydroxyethan-1,1-diphosphonsure; 1-HYDROXYETHYLIDENE-1,1-DIPHOSPHONICACIDHEDP; 1-Hydroxyethylidene-1,1-bis-(phosphonicacid); 1-HYDROXYETHYLIDENE-1,1-DIPHOSPHONICACID,98% HEDP

Sau Koj Cov Lus

Cov Khoom Qhia Txog Khoom

Rub tawm

Cov Cim Npe Khoom

Etidronic Acid HEDP CAS 2809-21-4 yog dab tsi?

Hydroxyethylenediphosphonic acid, tseem hu ua HEDP, yog ib qho diphosphonate compound siv rau hauv xab npum ntxuav tais diav, cov txheej txheem ntxuav dej, cov tshuaj pleev ib ce thiab kev tsim tshuaj. Cov ntsev uas tsim los ntawm cov kua qaub no muaj cov mis MnHEDP (M yog cation thiab n yog tus lej ntawm M, txog li 4).

Cov Lus Qhia Tshwj Xeeb

Qhov tsos	Cov kua ntshiab tsis muaj xim rau xim av daj, tsis muaj lwm yam khoom txawv teb chaws
Tsw tsw phem	Me ntsis tsis muaj dab tsi li
Cov kua qaub nquag (%)	60.0 feeb
Cov kua qaub phosphorous (%)	2.0 siab tshaj plaws
Cov kua qaub phosphoric (%)	0.8 siab tshaj
Chloride li Cl (ppm)	siab tshaj 100
Tus nqi sequestrant mg/g ua khoom ntawm PH 11-12	500 feeb
PH	2.0 siab tshaj plaws
Qhov Ceev	1.440 feeb
Cov ntsiab lus hlau	siab tshaj 35.0
Xim	siab tshaj 80

Daim Ntawv Thov

Hydroxy-ethylenediphosphonic acid yog ib hom tshuaj tshiab uas tsis muaj chlorine electroplating complexing agent, uas yog siv los ua tus neeg sawv cev tseem ceeb rau kev ruaj khov ntawm cov dej hauv cov dej txias thiab ua lub luag haujlwm ntawm kev tiv thaiv xeb thiab kev txwv tsis pub muaj nplai. Hydroxyethylenediphosphonic acid yog ib hom cathodic corrosion inhibitor thiab ib hom tshuaj uas tsis yog tshuaj lom neeg sib npaug. Thaum ua ke nrog lwm cov neeg sawv cev kho dej, nws qhia tau tias muaj txiaj ntsig zoo tshaj plaws.