Dipropylene glycol monomethyl ether CAS 34590-94-8

CAS:34590-94-8

Molecular Formula:C7H16O3

Molecular Luj:148.2 ib

Lub Sijhawm Cia:2 xyoo

Synonyms:(2-methoxymethylethoxy)-propano; 1-(2-methoxy-1-methylethoxy)-2-propanol; 1-(2-methoxyisopropoxy)-2-propanol; 1(los yog 2)-(2-methoxymethylethoxy)-propano; 1(los yog 2)-(2-methoxymethylethoxy)-Propanol; Di (propyleneglycol)methylether, 99%, mixtureofisomers; DPM; DOWANOL (R) DPM

Tso Koj Cov Lus

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Dipropylene glycol monomethyl ether CAS 34590-94-8 yog dab tsi?

Dipropylene glycol methyl ether (DPM), tseem hu ua dipropylene glycol monomethyl ether, yog xim tsis muaj xim, pob tshab, kua nplaum zoo nrog solubility zoo. Nws muaj qhov tsw qab ntxiag. Cov khoom yog ib puag ncig tus phooj ywg cawv ether hnyav nrog cov tshuaj toxicity tsawg, tsis muaj viscosity, tsis tshua muaj qhov nro, nruab nrab evaporation tus nqi, zoo solubility thiab coupling muaj peev xwm. Nws yog miscible kiag li nrog dej thiab ntau yam organic solvents thiab muaj zoo compatibility.

Specification

Yam khoom	SPECIFICATION
Qhov tshwm sim	Cov kua dej tsis muaj xim
Xim	15
Purity	≥99%
Cov ntsiab lus dej	≤0.1%
Distillation ntau yam	191.0-198.0 ℃

Daim ntawv thov

1.Coatings thiab xim

Solvent muaj nuj nqi: Raws li cov kuab tshuaj zoo heev, nws muaj qhov nruab nrab evaporation tus nqi thiab zoo solubility. Nws tuaj yeem yaj ntau yam resins, pigments thiab additives, yog li cov txheej txheem muaj fluidity zoo thiab txheej txheej, kom ntseeg tau tias cov txheej txheem sib npaug ntawm cov txheej txheem tsim kho kom tsim cov xim zoo nkauj thiab du.

Kev pab ua zaj duab xis: Thaum lub sij hawm ziab thiab zaj duab xis-txheej txheej txheej, nws tuaj yeem cuam tshuam nrog cov resin los txhawb kev tsim thiab kho cov xim zaj duab xis, txhim kho qhov zoo thiab ruaj khov ntawm cov xim zaj duab xis, thiab ua rau cov xim zaj duab xis zoo dua gloss, hardness thiab dej tsis kam.

2.Ink kev lag luam

Dissolution thiab dilution: Nws tuaj yeem yaj sai sai ntawm cov resin, pigment thiab lwm yam khoom hauv tus number case, kom tus number case muaj fluidity zoo thiab luam ntawv adaptability, xyuas kom meej tias tus number case yog smoothly xa mus rau cov ntaub ntawv luam tawm thaum lub sij hawm luam ntawv, thiab ua tiav cov txiaj ntsig zoo thiab raug luam tawm.

Kev kho kom qhuav: Kev ziab nrawm ntawm tus number case tuaj yeem hloov kho kom tsis txhob muaj tus number case ziab sai heev thaum lub sijhawm luam ntawv, ua rau cov khoom siv luam ntawv txhaws, lossis ziab qeeb dhau los cuam tshuam rau kev luam ntawv thiab kev ua haujlwm zoo, kom ntseeg tau tias kev ua haujlwm zoo ntawm kev luam ntawv.

3.Electronics Kev Lag Luam

Tus neeg saib xyuas tu: Nws muaj peev xwm ntxuav tau zoo rau cov pa phem xws li roj thiab plua plav ntawm cov khoom siv hluav taws xob, tuaj yeem tshem tawm impurities, thiab muaj qhov ceev ceev volatilization. Tsis muaj qhov seem tom qab ntxuav, uas yuav tsis ua rau cov khoom siv hluav taws xob puas, ua kom huv thiab ua haujlwm ntawm cov khoom siv hluav taws xob.

Photoresist hnyav: Nyob rau hauv cov txheej txheem photolithography, raws li cov kuab tshuaj rau photoresist, nws tuaj yeem ua rau photoresist sib npaug ntawm cov substrates xws li silicon wafers, thiab tuaj yeem evaporate sai sai thaum lub sijhawm photolithography txheej txheem yam tsis muaj kev cuam tshuam rau photoresist lub photolithography kev ua tau zoo thiab cov qauv daws teeb meem.

4. Cov khoom siv tshuaj pleev ib ce thiab kev tu tus kheej

Cov kuab tshuaj thiab cov diluents: Nws tuaj yeem yaj cov khoom xyaw xws li tshuaj tsw qab, roj, waxes, thiab lwm yam, kom cov tshuaj pleev ib ce muaj kev ntxhib los mos thiab zoo nkauj. Nyob rau tib lub sijhawm, nws tseem tuaj yeem siv los ua ib qho diluent los kho qhov sib xws thiab fluidity ntawm cov tshuaj pleev ib ce kom ua tau raws li cov qauv tsim ntawm cov khoom sib txawv.

Moisturizer: Nws muaj qee yam hygroscopicity, tuaj yeem nqus dej noo hauv huab cua, thiab tsim cov yeeb yaj kiab moisturizing ntawm daim tawv nqaij kom tiv thaiv cov tawv nqaij tsis muaj dej thiab ua kom cov tawv nqaij moist thiab du.